This EPI cassette ensures even spacing for uniform thermal exposure and is designed to withstand high temperatures and chemical exposure.

Benefits:

• Heat and Chemical Resistance: Designed to withstand the extreme temperatures in diffusion and oxidation processes.
• Precision Handling: Ensures wafers remain stable to avoid contamination or misalignment.
• Cleanroom Compatibility: Low particle generation to maintain process purity.

Material: Polyetherimide – PEI (Ultem):

• High-temperature resistance and mechanical strength.
• Low outgassing and minimal contamination, crucial for cleanroom environments.

Aluminum:

• Provides structural support and heat resistance.